Time-Resolved Analysis (TRA), also known as Depth Dependent Analysis, is a powerful technique for analyzing elemental composition within layered materials. By sputtering through individual matrix layers, the GD90 Trace provides highly detailed data on both matrix and trace elements, making it ideal for depth profiling, surface analysis, and failure analysis applications. With a specialized flat geometry glow discharge (GD) source, the GD90 Trace enables precise layer-by-layer analysis for a wide range of material types.
With TRA, the depth of each sputtered crater can be accurately measured using a profilometer, then entered into the software to analyze elemental composition layer by layer. The GD90 Trace’s low-flow GD source enables fine sputter control, achieving approximately 160 nm/min for conductive materials and 80 nm/min for non-conductive materials under standard conditions (with a 10mm ø crater). For greater precision, sputter rates can be reduced by over five times by lowering operating conditions, offering flexibility for sensitive applications.
Ideal for depth ranges from 0.1 to 10µm, the GD90 Trace can adapt its range by adjusting settings, making it suitable for analyzing thin films, coatings, and composite materials, including complex nanocomposites.
The GD90 Trace generates detailed spectra that reveal elemental changes as each surface layer is sputtered away, uncovering the underlying layers and any contaminants present. This depth-resolved data provides valuable insights for quality control, material research, and troubleshooting in manufacturing.
Visit our GDMS Technology and GD90 Trace Applications pages to explore how the GD90 Trace can elevate your analytical capabilities.
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